Advantest Introduces Advanced Mask CD-SEM “E3660”
2nm Node-Ready System with Enhanced Reproducibility, Throughput, and Curvilinear Pattern Measurement
TOKYO, Sept. 09, 2025 (GLOBE NEWSWIRE) -- Leading semiconductor test equipment supplier (TSE: 6857) today announced the release of its next-generation CD-SEM* E3660, engineered for the dimensional metrology of photomasks and EUV masks used in cutting-edge semiconductor manufacturing. Compared to the previous generation’s , the E3660 delivers more than a 20% improvement in CD reproducibility, enabling process engineers to meet the stringent requirements of mask manufacturing at the 2nm node and beyond. By reinforcing lithography process control in advanced device fabrication, the E3660 furthers Advantest’s vision of providing holistic test solutions across the semiconductor value chain.
In state-of-the-art semiconductor device fabrication, continuous scaling and pattern complexity are driving a sharp increase in lithographic hotspots—locations where multi-patterning and pattern transfer become particularly error-prone. Masks used to form wafer circuitry are evolving, with higher layer counts and more intricate geometries. This, in turn, has significantly increased the number of required metrology sites, demanding measurement systems with both higher throughput and superior reproducibility.
The industry is also transitioning toward curvilinear mask patterns, enabled by advances in multi-beam mask writing and high-performance computing. These patterns are expected to see large-scale deployment around 2027 with the adoption of High Numerical Aperture EUV lithography in device production. To ensure design-to-mask fidelity under these conditions, CD-SEMs must not only provide highly reproducible critical dimension measurements but also generate SEM images with greater fidelity to true pattern contours. Moreover, metrology solutions must evolve to incorporate curvature-sensitive algorithms capable of quantifying deviations between complex mask features and original design intent.
Leading up to the development of the E3660, Advantest has collaborated with imec, a world-leading research and innovation hub in nanoelectronics and digital technologies, to validate the correlation of CD-SEM results obtained from the “E3650” with those from Advantest’s previous generation CD-SEMs and EDA-based reference data. This enabled Advantest to improve metrology reliability and work with imec to advance the development and validation of new measurement techniques for curvilinear geometries. The E3660 platform reflects the outcome of this collaboration, achieving the reproducibility required for 2nm node mask manufacturing, enabling high-throughput measurement to handle increasing site counts, and providing unique measurement functions for curvilinear patterns.
By integrating these capabilities, the E3660 is positioned to deliver robust metrology support for the next generation of mask R&D and production environments.
Advantest will initially target the E3660 for deployment at Merchant Mask Shops, where commercial mask manufacturers produce masks for external customers, and Captive Mask Shops, which are in-house mask production facilities of semiconductor manufacturers. This activity establishes the E3660 as a core evaluation tool for advanced mask development and production qualification.
*Critical Dimension Scanning Electron Microscope: an electron microscope specialized for high-precision measurement of fine pattern dimensions on semiconductor wafers and masks.
About Advantest Corporation
Advantest (TSE: 6857) is the leading manufacturer of automatic test and measurement equipment used in the design and production of semiconductors for applications including 5G communications, the Internet of Things (IoT), autonomous vehicles, high-performance computing (HPC), including artificial intelligence (AI) and machine learning, and more. Its leading-edge systems and products are integrated into the most advanced semiconductor production lines in the world. The company also conducts R&D to address emerging testing challenges and applications; develops advanced test-interface solutions for wafer sort and final test; produces scanning electron microscopes essential to photomask manufacturing; and offers system-level test solutions and other test-related accessories. Founded in Tokyo in 1954, Advantest is a global company with facilities around the world and an international commitment to sustainable practices and social responsibility. More information is available at .
Advantest Corporation
3061 Zanker Road
San Jose, CA 95134, USA
Cassandra Koenig
A photo accompanying this announcement is available at .
